The Raith VELION FIB-SEM tool has arrived at MIT.nano. VELION offers unique capabilities for advanced FIB nanofabrication while also allowing sample preparation, process control, and entry level e-beam lithography—all in one tool! We are excited to offer this tool by Raith, one of MIT.nano's Consortium Members, to our users. It will be installed in one of the characterization suites on MIT.nano's lower level.
More information about this tool is listed below, courtesy of Raith.
VELION is a novel FIB-SEM instrument in which FIB nanofabrication has matured into the standard technique for fabricating three dimensional and high resolution nanostructures, such as plasmonic devices, nano-fluidics, localized implantation and functionalization.
With its unique set-up of a vertical FIB-column and attached SEM, in combination with Raith’s laser interferometer stage and mature lithography technology, VELION truly defines FIB nanofabrication as the priority technique. The dedicated system architecture ensures unrivaled stability, accuracy, and automation. Even the most complex structures can be fabricated with highest precision, completely unattended over many hours.