The most advanced microchips are currently being manufactured using EUV lithography. Prof. Smith will discuss a maskless alternative based on transmissive diffractive optics operating at the 4.5 nm soft x-ray wavelength. The system, called X-ZPAL, will circumvent the high cost of EUV as well as the problems imposed by EUV’s reflective optics, while achieving the same resolution and greater flexibility in the design of microchips.
3:00 p.m. – 4:00 p.m. ET
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