August 10, 2020
The new rapid thermal annealing (RTA) system cleared customs and was delivered. It can anneal samples ranging from pieces to 6-inch wafers in size, using either a vacuum or inert atmosphere, and with temperatures up to 1300C (~2400 F).
Here it is in its crate at MIT.nano. Installation will start soon, but is more complex (as the tool needs a combination of electric power, cooling, gas lines and exhaust).
