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MIT.nano 2024 IAP courses
MIT IAP 2024—MIT.nano: A Brief Introduction to e-beam Lithography
MIT IAP 2024—MIT.nano: A Brief Introduction to e-beam Lithography
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Registration is now closed.
Instructors:
Mark Mondol, Assistant Director Nano Structures Laboratory; Juan Ferrera, Research Scientist
Date/Time:
Thursday, January 18, 2024, 1:00 - 2:30pm
Location:
MIT.nano Building 12 Room 0168 (Basement teaching space)
Advanced sign-up required.
Register by January 17, 2024. Open to MIT Community. Limited to 40 participants.
E-beam lithography enables advanced semiconductor chips; without e-beam lithography minimum features sizes would be limited to approximately 200 nm. In research environments e-beam lithography allows direct write, maskless lithography enabling quick and relatively cheap design changes.
This talk introduces the basics of e-beam lithography and pattern transfer, including electron energy, material interaction, limits to resolution, e-beam resists, throughput, proximity effect correction and characteristics of different e-beam lithography tools.
Anyone with an interest in e-beam lithography, from neophyte to experienced user, should be able to gain something from this talk.
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