Advancing Nanoscale Science and Engineering with EBL, FIB, and SEM Nanofabrication

Sponsored by Raith Nanofabrication

Wednesday, December 13, 2017
13-2137, Von Hippel Room
105 Massachusetts Ave (Rear)
Cambridge, MA 02139
10:00am–4:00pm 

Agenda

10:00 AM

Introduction to Electron Beam Lithography (EBL)
Prof. Berggren Group, MIT

10:20 AM

EBPG Technology for Advanced EBL
Mike Butler, Raith GmbH

10:45 AM

State-of-the-Art EBL Applications Results with EBPG Technology
David Kim, MIT Lincoln Laboratory
Lan Zhang, Raith America

11:45 AM

VOYAGER Technology, Sub-1Å Pitch Control with Zero Stitching Errors for Photonics, and other Workhorse Applications
Jason Sanabia, Raith America

12:15 AM

EBL discussion / L U N C H

1:00 PM

Advanced FIB Nanofabrication with Laser Interferometer Stage, Multiple Ion Species and Future Unique Capabilities
Sven Bauerdick, Raith GmbH

2:00 PM

Unique Nanofabrication and Microscopy Applications with SEM-based EBL (including CD-SEM-Lite) and Helium/Neon Ion Microscope Instrumentation
Jason Sanabia, Raith America

3:00 PM

Round Table Discussion – all topics