FeSEM Microscopy Workshop with ZEISS - March 20

Advanced imaging modes in ZEISS field-emission SEMs

Date: Wednesday, March 20, 2024
Time: 9:30 a.m. – 4:30 p.m. ET
Location: 12-0168 (MIT.nano basement)
Lunch will be provided to registered participants, sponsored by Zeiss

There will be an image contest during lunch. 

Image Contest 

We invite you to submit your best image taken using the Zeiss field emission SEMs at MIT.nano for a chance to win a pair of Zeiss binoculars. Please provide a short description of your image and the imaging conditions.

Register for this talk


What to like about imaging with Gemini optics in ZEISS field-emission SEMs
Sandip Basu, Product Marketing Manager, Carl ZEISS Microscopy

Join us as we unravel the transformative potential of surface-sensitive imaging in unlocking new frontiers across various scientific disciplines.

In recent years, the significance of surface-sensitive imaging has surged within the realm of electron microscopy. Understanding when, why and how to image surfaces at low beam energy without compromising resolution integrity and repeatability is crucial for many application fields. 

In this presentation, we will delve into the essential nuances of achieving reliable, repeatable low-voltage imaging, alongside exploring pivotal examples to illuminate its practical applications. We'll analyze the primary challenges inherent in attaining optimal resolution and harnessing unique contrast mechanisms that benefit low-voltage imaging. Moreover, we'll navigate through the intricacies of implementing these techniques within Zeiss field-emission SEMs, contextualizing their relevance across diverse domains such as nanofabrication, energy, healthcare, and semiconductor applications. 

Advanced imaging modes in ZEISS field-emission SEMs
Jeff Marshman, Sr. Applications Engineer, Carl ZEISS Microscopy
Anthony Lisi, Product Applications Sales Specialist, Carl ZEISS Microscopy 

Advanced imaging modes have become increasingly important in the field of scanning electron microscopy (SEM). Zeiss field emission SEMs offer a range of high-resolution imaging techniques, including a selection of BSE imaging, high-contrast high-resolution imaging in variable pressure (VP) mode, high-angle annular dark field (HAADF) imaging in STEM mode, and cathodoluminescence (CL).

In this presentation, we will discuss how the beam stability and ease-of-use in switching between imaging and analytics mode in the Zeiss FE-SEMs with dual-condenser electron optic column help in better detection efficiency for energy dispersive X-ray spectroscopy (EDS), and electron backscatter diffraction (EBSD). These techniques allow for the characterization of materials at a micro- and nanoscale, providing detailed information on composition, crystal structure, and morphology. 

In addition, Zeiss field emission SEMs offer the ability to perform in situ experiments, such as heating or cooling samples, to observe dynamic changes in material properties. These advanced imaging modes are critical for researchers in a variety of fields, including materials science, nanotechnology, and biology.

In Situ SEM Mechanical Characterization of 3D Micro-Architected Materials
James U. Surjadi, Carlos M. Portela, Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA

Micro-architected materials represent a new paradigm of materials which provide a pathway to defy the limitations of traditional monolithic materials through their engineered internal microstructures, allowing them to exhibit unique and extreme properties, such as high strength at ultralow densities or large ductility/stretchability from brittle constituents. However, understanding their mechanical response is not trivial, owing to their complex and micro/nano-scale features. Our in situ SEM nanomechanical testing setup serves as a powerful tool, enabling us not only to visualize their deformation behavior during mechanical loading (e.g., compression, tension) but also to capture corresponding force-displacement curves. This capability provides us with the means to conduct a comprehensive analysis of their mechanical properties. One example of such analysis, impossible without in situ SEM mechanical characterization, is that of our recently proposed 3D woven micro-architected materials. These materials are unique, as they are compliant and highly stretchable (up to 10 times more stretchable than its constituent bulk material), but their mechanics involve numerous frictional self-contact due to entanglements between the woven fibers. In situ mechanical testing enables us to observe how these complex architected materials deform, making it possible to model and optimize the design of these architectures. Overall, visualizing and understanding the mechanical response of these micro-architected materials could potentially open new avenues for the creation of unique materials such as flexible glass/ceramics/semiconductors, ultra-light metals with rubber-like response, and scalable nanomaterials for next-generation engineering devices.

12:00PM-1PM Lunch (sponsored by Zeiss) and image contest 

1PM-4PM Hands-on Demonstration: Best practices for superior imaging and analytics using ZEISS field-emission SEMs 
Jeff Marshman, Sr. Applications Engineer, Carl ZEISS Microscopy