SPEAKER: Professor Hank Smith
Electrical Engineering Emeritus
DATE: Wednesday, February 19
TIME: 3:00 p.m. — 4:00 p.m.
LOCATION: Haus Room (36-428)
The most advanced microchips are currently being manufactured using EUV lithography. Prof. Smith will discuss a maskless alternative based on transmissive diffractive optics operating at the 4.5 nm soft x-ray wavelength. The system, called X-ZPAL, will circumvent the high cost of EUV as well as the problems imposed by EUV’s reflective optics, while achieving the same resolution and greater flexibility in the design of microchips.