Picomaster 200 high-resolution maskless photolithography system
DATE: Thursday, March 6, 2025
TIME: 11 a.m. – 1 p.m.
LOCATION: MIT.nano (12-0168)
SPEAKER: Kahraman Keskinbora, PhD
ABSTRACT
The Raith PICOMASTER 200 is a cutting-edge tool designed for high-resolution maskless photolithography applications, offering unparalleled resolution and accuracy for both research and industrial environments. In this tool talk, we will explore the PM 200's advanced laser writing capabilities, including its high-dynamic range intensity control, automated alignment features, high-performance autofocus and variable resolution exposure systems.
Attendees will gain insights into how the PM 200 streamlines fabrication workflows even on small or challenging substrates, reduces setup time, and enhances repeatability, making it an ideal choice for materials science, semiconductor, MEMS, and micro-optical device manufacturing. Join us to learn how this state-of-the-art system can be used to address your micro- and nanofabrication challenges.