February 18, 2025
To help encourage users to try out the new Raith Picomaster 200 and develop/shift their processes to it, MIT.nano will be waiving tool charges on the PicoMaster for February, March, and April.
The Raith Picomaster 200 is a direct write optical lithography below 1 um. It can be used interchangeably with the MLA-150 (no process resubmission needed for regular AZ resist).
The tool's sweet spot is pieces (not wafers), and it’s perfect for minimum feature sizes from around 0.3 to 1um. If you’re currently writing larger lines with EBL, it may also offer a good alternative to EBL.
Contact Dennis Ward and Scott Poesse for training on the tool.