May 10, 2021
MIT.nano staff have noticed some confusion about developers. To help clarify, here’s a quick summary (based on the wet chemical process training):
1. AZ300: 0.26N (2.38%) TMAH solution, no surfactant. Can be used with AZ 3312 (thin) or AZ nLOF resists.
2. AZ726: 0.26N (2.38%) TMAH solution, with surfactant. Can be used with AZ 3312 (thin) or AZ nLOF resists.
- The added surfactant improves substrate wetting and can result in more uniform developing.
- This developer is roughly equivalent to the CD-26 in building 39 and should be an improvement over AZ300 for sensitive processes.
- This developer will be plumbed to the Brewer and pTrack as the primary lab developer.
3. AZ435: 0.35N (3.2%) TMAH solution, no surfactant. Can be used with AZ 10XT (thick) for faster developing.
Email mitnano-feedback@mit.edu with any questions.