June 25, 2019
MIT.nano's new fluorine-chemistry plasma etcher, seen from the user-side in the cleanroom below. Almost the entire machine is located inside the chase, making maintenance easier while maximizing cleanroom space for lab users.
In this second photo, you can see the new plasma etcher from inside the chase. Almost the entire tool plus support equipment (like pumps) and all of the gas, water, electrical connections are routed to the tool this way. In the cleanroom it may look like a small opening, but behind that is a lot of complexity, which users will be able to see through the windows in the bay-chase partitions.
