Mechanical engineers are developing technologies that could prevent heat from entering or escaping windows, potentially preventing a massive loss of energy.
The new MLA-150, a direct-write laser system that can expose UV sensitive photoresist on wafers or masks, has arrived at MIT.nano and we unpacked it today! See the whole process in this nine-image photo story.
The new MLA-150 for MIT.nano's cleanroom has arrived by air freight. Installation will be in progress throughout the month of January. The tool will be located on the first floor.
The Microsystems Annual Research Conference (MARC) is a two-day event celebrating the scientific achievements of students and staff pursuing research at the frontiers of micro/nanotechnology at MIT.
Three undergraduate students in course 3.155J/6.152J went on one of the in-depth small tours of MIT.nano, exploring the infrastructure to see what makes the lab run.