Facility Updates

During the upcoming holidays, MIT.nano will be closed to regular users during the two extended weekends (December 24–26, and December 31–January 2). We will operate on "after hours" schedule, and 24-hour users can continue to use the fab, like on all holidays.

For the four days between the long weekends, several staff have volunteered to help replenish supplies in Buildings 12 & 39, and to maintain lab safety including chemicals/waste. That means regular users can use the fabs 9 AM – 5 PM Monday (12/27) – Thursday (12/30). 

Read more, and see a detailed schedule, in this update.

MIT.nano has received the Al pucks for the ESI Asher for users to run descum and ashing on pieces. Read more in this update.

Fab.nano will be closed for Thanksgiving as well as the extended MIT Winter Break. Read dates and policies for holiday operations in this update.

The pricing for large sample Fab.nano storage cubbies is increasing as of January 2022.

Read more in this update.

The Sigma300 Scanning Electron Microscope in Fab.nano will be coming online the first week of November.

Read more in this update.

MIT.nano staff have placed a cold-plate (CORAL Coldplate-Solvent) for PMMA developing in Liftoff-L10.

Read more in this update.

The MRSI die bonder in MIT.nano's fifth floor packaging space can be used for in-situ assembly processes such as eutectic die bonding, UV epoxy die attach, and flip chip assembly via machine vision. Read more in this update.

Fab.nano will be closed on Monday, October 11th in observance of Indigenous Peoples Day. As usual during Institute holidays, the fabs in Buildings 39 & 12 will not be staffed, so they will be open only to qualified 24-hr users.

Read more in this update.

MIT.nano's new ESI asher was started up this week. It is capable of fast ashing from pieces up to 8” wafers, and has a 25-wafer cassette.

Read more about this new tool in this update.

The Spinner-Resist-L10 (new tool) is now online in L10. For usage/what-to-spin, it is identical to Spinner-Resist-U12. This new spinner has a programmable exhaust during spinning, which can be beneficial when optimizing uniformity on thick resists.

Read more in this update.