Facility Updates

Spinner-EBL: EBeam-lithography resists now in 6U

The new ultracold fridge has been relocated to cleanroom bay 6U, right next to the EBL spinner hood, stocked with HSQ 6%. ZEP, ma-N, PMMA and CSAR are located in the passthrough at the end of that same bay.

Helpful tips about developers

MIT.nano staff have noticed some confusion about developers. To help clarify, here’s a quick summary, based on the wet chemical process training.

Limited access to Level 3 Room 7U

As part of the Process Cooling Water (PCW) reinstallation project, MIT.nano Level 3 Room 7U (12-3160B) will be an active construction area Tuesday, April 20 through Friday, April 23. This space will be off limits from 6:30 a.m. – 3:30 p.m.

Read more in this update.

MLA-150 tips & tricks

MIT.nano's Assistant Director for User Services at Fab.nano Jorg Scholvin has put together this list of helpful tips and tricks for MLA-150 users.

Process Cooling Water (PCW) reinstallation

As part of the Process Cooling Water (PCW) re-installation project, the level 3 cleanroom chase corridor and level 3 lab spaces will be parts of an active construction area starting Monday, March 22. This work will interrupt the path from the main gowning area to soft lithography and to ESP lab space. In order to minimize overlap between users and the construction activity, alternate paths to these spaces with be provided.

Read more in this update.